Technology: Chemical Vapor Deposition (CVD)
ALTUS Product Family
Atomic Layer Deposition (ALD) Chemical Vapor Deposition (CVD)
Combining CVD and ALD technologies, these market-leading systems deposit highly conformal metal films for advanced tungsten metallization applications.
Reliant Deposition Products
Chemical Vapor Deposition (CVD) High-Density Plasma Chemical Vapor Deposition (HDP-CVD) Plasma-Enhanced Chemical Vapor Deposition (PECVD) Pulsed Laser Deposition (PLD) Reliant Systems
Our Reliant deposition products enable roadmaps for Specialty Technologies and extend the productive life of fabs.
Advanced Memory, Advanced Packaging, Analog & Mixed Signal, Discrete & Power Devices, Interconnect, Optoelectronics & Photonics, Patterning, RF MEMS, Sensors & Transducers, Transistor